http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008089709-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15 |
| filingDate | 2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e52b324eaf8974a99f0f790f68198744 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98105e9270effbb4e607e5be74f35fa4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_747bf730052a64b84b3fef2cce74fcaa |
| publicationDate | 2008-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008089709-A |
| titleOfInvention | PATTERN FORMING SUBSTRATE, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD |
| abstract | When the required accuracy with respect to semiconductor circuit pattern dimensions approaches the resist molecule size with miniaturization, device performance deteriorates due to the edge roughness of the resist pattern, which adversely affects system performance. A mixture of compounds having a functional group that is chemically converted by the action of an acid and has reduced solubility in an alkaline developer in an amount of 0 to 6 per molecule. The polynuclear phenol compound having a structure in which triphenylmethane structures are connected non-conjugatedly, the functional group being bonded to the phenolic hydroxyl group of the polynuclear phenol compound, and having 0 functional group per molecule, 15% or less, and the polynuclear phenol compound having 3 or more functional groups per molecule has a weight ratio of 40% or less and the number of the functional groups bonded to the polynuclear phenol compound is on average. A pattern-forming substrate characterized in that it is 2.5 or less per molecule is used. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012088697-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8339542-B2 |
| priorityDate | 2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 156.