| abstract |
The present invention provides a method for manufacturing an electrode substrate having electrodes formed on both surfaces with a simple process and high yield. A method of manufacturing an electrode substrate in which a plurality of first electrodes and a plurality of second electrodes are patterned on a first surface and a second surface forming front and back surfaces of the substrate, respectively. A step ST01 of forming a polycrystalline ITO film, a step ST04 of forming an amorphous ITO film on the second surface, and patterning the amorphous ITO film using an etching solution for selectively removing the amorphous ITO film. Step ST05 for forming the second electrode on the second surface, Step ST08 for forming a protective film covering the second electrode, and patterning the polycrystalline ITO film on the first surface to form the first electrode Step ST09. [Selection] Figure 3 |