http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076982-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6602369c5727b11b03570b310bf13f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_311ddcbdfb459b3b688c1802943f25c9 |
| publicationDate | 2008-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008076982-A |
| titleOfInvention | Resist protective film material and resist pattern forming method |
| abstract | Provided are a resist protective film material used in an immersion lithography method in which an immersion liquid is a non-aqueous liquid medium, and a method for forming a resist pattern. An alkali-soluble resist protective film material used in an immersion lithography method in which an immersion liquid is a non-aqueous liquid medium, which is formed by polymerization of a polyfluoroalkyl group-containing vinyl monomer (f). A resist protective film material containing a fluorine-containing polymer (F) containing a repeating unit (F) and having a receding angle with respect to decalin of 40 ° or more, and a method for forming a resist pattern. [Selection figure] None |
| priorityDate | 2006-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.