http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076631-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-12 |
| filingDate | 2006-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_311ddcbdfb459b3b688c1802943f25c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6602369c5727b11b03570b310bf13f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f547659a3ddd38a252630d9df024dae |
| publicationDate | 2008-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008076631-A |
| titleOfInvention | Resist material and resist pattern forming method |
| abstract | A resist material and a resist pattern forming method used in an immersion lithography method in which an immersion liquid is a non-aqueous liquid medium. A resist material whose alkali solubility is increased by the action of an acid used in an immersion lithography method in which the immersion liquid is a non-aqueous liquid medium, which contains a polymeric fluorine-containing compound (F), and has a resistance to decalin. A resist material having a receding angle of 30 ° or more, and a resist pattern forming method by the immersion lithography method, wherein a resist forming composition containing the resist material is applied onto a substrate to form a resist film on the substrate A resist pattern forming method for forming a resist pattern on a substrate, wherein a step of performing, an immersion lithography step, and a development step are performed in this order. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014181322-A |
| priorityDate | 2006-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 141.