http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008066471-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
filingDate 2006-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beccf6551ddbb20126b8031d86f34518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f3cf3b570bac99b463348bc00895198
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b5129cab3d531dbf47e3fa8ae1031fc
publicationDate 2008-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008066471-A
titleOfInvention Ferroelectric memory and manufacturing method thereof
abstract A ferroelectric memory with improved retention characteristics and a method for manufacturing the same are provided. In a ferroelectric memory in which an insulator film, a ferroelectric film, and a metal film are sequentially laminated on a semiconductor substrate, the surface of the ferroelectric film is irradiated with neutral radicals. Thus, the modified layer 6 that increases the potential barrier of the ferroelectric film with respect to the metal film is formed at the interface between the ferroelectric film 3 and the metal film 4. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011195348-A
priorityDate 2006-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947

Total number of triples: 17.