http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008065328-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2007-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5472f15aeda45041f827fcec236b912f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22e079ca82d902393e723990651b790a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73161c5bb753e344b5d68ad28624571f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24d8f1ebaeee530e4330bb68ab90f815 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab68894cc8046bd8f9d6ca672de9655b |
publicationDate | 2008-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008065328-A |
titleOfInvention | Composition for resist removal inducing selective decomposition reaction of ozone |
abstract | The present invention relates to a resist removal composition and a resist removal and decomposition method using the same, and more particularly to a resist removal composition containing a carbamate compound. The composition for removing a resist of the present invention selectively decomposes resist residues generated by removing a resist during a process using ozone, dramatically improves the number of treatments, and corrodes metal wiring or an oxide film. There is an effect to prevent. A resist removal composition comprising (a) a cyclic lactone compound and (b) an amide compound, a carbamate compound, or a mixture thereof is provided. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010183853-A1 |
priorityDate | 2006-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.