http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008053453-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2006-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c236a267e1135c126221f3e7a800a717 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23ac966afbeb9048fc31cfdcc74e8fcb |
publicationDate | 2008-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008053453-A |
titleOfInvention | Exposure apparatus and exposure method |
abstract | The substrate can be moved quickly in the vertical direction, and the exposure time of the substrate can be shortened. An exposure apparatus according to the present invention is provided with a light source 20 for irradiating ultraviolet rays, an exposure mask 15 disposed below the light source 20, and a lower part of the exposure mask 15. And a stage 10 that can move horizontally to a position 10B. The stage 10 is movable up and down. While the stage 10 moves in the horizontal direction from one operating position 10A to another operating position 10B, the stage 10 descends downward and then rises to return to the same height position as the one operating position 10A. [Selection] Figure 1 |
priorityDate | 2006-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415821907 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID122034 |
Total number of triples: 14.