http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008047597-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0c468e687b43595cae7cb1c2667678f1
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2006-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c56d7e5133db849a31b9d4f828fdb91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4b9977ef5bff9e960253ab6bf0b73b4
publicationDate 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008047597-A
titleOfInvention Vapor growth equipment
abstract PROBLEM TO BE SOLVED: To improve a conventional vapor phase growth apparatus, which is not sufficient from the viewpoint of safety and still needs to be improved. The present invention has been made in response to the above-described points, and provides a novel vapor phase growth apparatus with greatly improved safety. According to the vapor phase growth apparatus of the present invention, it is possible to provide a novel vapor phase growth apparatus with greatly improved safety. Specifically, the chamber 103 can be used on the spot after replacement of ClF 3 gas. It becomes possible to measure whether the ClF 3 gas concentration in the atmosphere in the (reactor) and exhaust pipe 107 is lowered to a safe concentration. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103160922-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018056419-A1
priorityDate 2006-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.