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filingDate 2006-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_261cf5b5e04f32ccb36e4e4fe13cb989
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publicationDate 2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008038048-A
titleOfInvention Film production method
abstract An object of the present invention is to provide a method of manufacturing an insulating film useful as a material for an electronic device, and to provide a manufacturing method capable of making the insulating layer thin and uniform. And In a method of manufacturing an insulating film, which includes applying a varnish on a support by a microgravure method and then drying to form an insulating material layer, the travel speed S (m / min) of the support is determined. ) The ratio G / S of the rotational speed G (m / min) of the gravure roll to) is 0.75 or more. [Selection figure] None
priorityDate 2006-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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