abstract |
An object of the present invention is to provide a method of manufacturing an insulating film useful as a material for an electronic device, and to provide a manufacturing method capable of making the insulating layer thin and uniform. And In a method of manufacturing an insulating film, which includes applying a varnish on a support by a microgravure method and then drying to form an insulating material layer, the travel speed S (m / min) of the support is determined. ) The ratio G / S of the rotational speed G (m / min) of the gravure roll to) is 0.75 or more. [Selection figure] None |