| abstract |
A positive resist composition and a resist pattern forming method capable of forming a resist pattern having a good shape are provided. A positive resist composition comprising a resin component (A) and an acid generator component (B), wherein the component (A) comprises a structural unit (a1) derived from hydroxystyrene, A positive resist composition comprising a structural unit (a2) having an acetal type acid dissociable, dissolution inhibiting group, and wherein the component (B) is a triarylsulfonium salt type onium salt. [Selection figure] None |