| abstract |
[PROBLEMS] To provide an antireflection film by a wet process method that has near-infrared absorption performance and antireflection performance, is excellent in scratch resistance and antistatic properties, has a simple layer structure and low cost, and is particularly suitable for PDP use. provide. SOLUTION: On one surface of a base film, (A) a hard coat layer having a thickness of 2 to 20 μm containing a cured resin by irradiation with active energy rays and a near infrared absorber, and (B) curing by irradiation with active energy rays. An antireflection film comprising a resin and a low refractive index layer having a refractive index of 1.43 or less and a thickness of 50 to 200 nm, which is sequentially laminated, wherein the layer (A) and / or the layer (B) is an ion And an antireflection film having a spectral transmittance of 30% or less in the entire region having a wavelength of 800 to 1200 nm. [Selection figure] None |