http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008020629-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 2006-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef98f18a9ee8a6d800f3db238396c069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad9bf50d1f42b1c0c557fa66a8b50d1d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f275219eeec09d70adc861420630bb9 |
| publicationDate | 2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008020629-A |
| titleOfInvention | Pattern forming material, pattern forming apparatus and pattern forming method |
| abstract | By combining a predetermined polymerizable compound and further adjusting the sensitivity of a photosensitive layer within a certain range, the sensitivity and resolution are high, the tent film strength is strong, the adhesion is excellent, and the unexposed film is broken. There are still provided a pattern forming material, a pattern forming apparatus, and a pattern forming method excellent in the prevention effect. A support and at least a photosensitive layer on the support, the photosensitive layer including at least a binder, a polymerizable compound, and a photopolymerization initiator, wherein the polymerizable compound has a bisphenol skeleton. A photosensitive compound having a polymerizable compound (a-1) having 4 or more reactive groups in the molecule and having a molecular weight of 700 or more. The pattern forming material, wherein the minimum energy of light used for the exposure that does not change the thickness of the portion after the exposure and development is 0.1 to 50 mJ / cm 2 , and the pattern using the pattern forming material Forming method and the like. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016151654-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5221543-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200087270-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200087269-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102282817-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009022724-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102281035-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018100640-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014048340-A |
| priorityDate | 2006-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 225.