| abstract |
In a laser-produced plasma type extreme ultraviolet light source device, charged particles such as ions emitted from plasma by the action of a magnetic field are efficiently discharged, and secondary generation of contaminants is suppressed. SOLUTION: A target nozzle 4 for supplying a target material 11, a laser oscillator 1 for generating plasma by irradiating the target material 11 supplied by the target nozzle 4 with a laser beam, and emitted from the plasma. An EUV collector mirror 5 that collects extreme ultraviolet light, and an electromagnet 6 that forms a magnetic field at a position where the target material 11 is irradiated with a laser beam, and has an aperture that matches the shape of the magnetic flux lines 12 of the magnetic field. And electromagnets 6 and 7 formed with portions 6a and 7a. [Selection] Figure 1 |