http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008010533-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2006-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1de9d0c900185bec98c3884ac5cdc3b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_040508c651f0d0148cc9881dca9b1a7b |
| publicationDate | 2008-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008010533-A |
| titleOfInvention | How to remove resist pattern |
| abstract | There is provided a resist pattern removing method capable of completely removing a resist pattern having a hardened layer formed on a surface by treatment using a supercritical fluid. In this method, a resist pattern 101 whose surface is covered with a hardened layer A is removed from a substrate 100. First, in the first step, a conversion agent having an action of weakening the adhesion between the hardened layer A and the substrate 100 at a portion where the hardened layer A and the substrate 100 are in contact with each other without eluting the resist component 101a covered with the hardened layer A. Process using supercritical fluid containing. In the next second step, the hardened layer A is lifted off from the substrate 100 by performing a process using a supercritical fluid containing an organic solvent that dissolves the resist component 101a. [Selection] Figure 1 |
| priorityDate | 2006-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.