http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007526626-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2004-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007526626-A |
| titleOfInvention | CMP of precious metals |
| abstract | The present invention includes (i) contacting a substrate comprising a noble metal layer with (a) a polishing component, (b) an oxidizing agent and (c) a chemical mechanical polishing system comprising a liquid carrier, and (ii) the noble metal layer There is provided a method for polishing a substrate, comprising a step of polishing at least a part of the substrate to polish the substrate. The polishing component is selected from the group consisting of an abrasive, a polishing pad or a combination thereof, and the oxidizing agent is bromate, bromite, hypobromite, chlorate, chlorite, hypochlorite. It is selected from the group consisting of chlorate, perchlorate, iodate, hypoiodite, periodate, peroxyacetic acid, organic halooxy compounds, salts thereof, and combinations thereof. The chemical mechanical polishing system has a pH of 9 or less and the oxidant does not produce a substantial amount of elemental halogen. The present invention also provides a method of polishing a substrate comprising a noble metal layer and a second layer with the above polishing system further comprising a blocking compound. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8900473-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010016390-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10796921-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014007415-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5429169-B2 |
| priorityDate | 2003-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 176.