| abstract |
A method of continuously vacuum cleaning a substrate, -Select chemically active species with low sputtering efficiency in terms of contamination, Generating a plasma from a gas mixture mainly containing low sputtering efficiency species, in particular based on oxygen, using at least one linear ion source; The present invention relates to a method characterized in that at least one surface portion of the substrate is to be irradiated with the plasma, and the ionic species at least partially removes contamination adsorbed or adhered to the surface portion by a chemical reaction. It is an invention. |