| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 |
| filingDate |
2004-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2007-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007510173-A |
| titleOfInvention |
Process of using bischoline and trischoline in cleaning quartz coated polysilicon and other materials |
| abstract |
New cleaning chemistries based on bischoline and trischoline compounds are provided for the purpose of removing photoresist and flux while minimizing substrate etching. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4773562-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013504782-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009538456-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101521066-B1 |
| priorityDate |
2003-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |