http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007507900-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 |
| filingDate | 2004-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007507900-A |
| titleOfInvention | Absorbing layer for dynamic surface annealing |
| abstract | A method of processing a substrate, comprising depositing a layer comprising amorphous carbon on the substrate, and then subjecting the substrate to about 600 nm under conditions sufficient to heat the layer to a temperature of at least about 300 ° C. Exposing to electromagnetic radiation having one or more wavelengths of about 1000 nm. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorbing layer that absorbs electromagnetic radiation and anneals the top surface of the substrate. In one aspect, the substrate is exposed to electromagnetic radiation in a laser annealing process. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014534641-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014090045-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010503202-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008270746-A |
| priorityDate | 2003-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.