| abstract |
A protective layer (208) is formed on the surface of the atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor 100. The part defining the reaction space (200) for the ALD or CVD reactor (100) is made using chemicals (206) that deactivate the reactive sites (210) on the reaction space surface (210). It can be processed in situ or ex situ. The pre-processing step (502) can maximize the reactive sites (210) present prior to the processing step (504). When the reactive sites (210) were deactivated by the adsorbed processing reactant (208), during subsequent processing, the reactant gas (214) reduced the reactivity or deposition on these processed surfaces. . Thus, the purge steps (310, 314) are greatly shortened and a greater number of runs can be performed during the cleaning step to remove the build up accumulated on the reactor walls. |