http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007333881-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
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filingDate 2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f78bc8e18a2c435657140bdbc27b375
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29ff8364949f8ce9eb0154f8a2968a27
publicationDate 2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007333881-A
titleOfInvention Method for manufacturing antireflection structure, and method for manufacturing mold, glass molding, or resin molding using antireflection structure
abstract A method for manufacturing an antireflection structure easily and inexpensively is provided. An X-ray photosensitive film is formed on a substrate. A plurality of granular bodies 12 that transmit X-rays are arranged on the X-ray photosensitive film 11 at a pitch equal to or less than the wavelength of the light that is prevented from being reflected by the light reflection preventing uneven structure 3. An X-ray shielding film 14 including an X-ray shielding material is formed on the plurality of arranged granules 12 so as to include the plurality of granules 12. The X-ray photosensitive film 11 is patterned into a predetermined pattern by developing after irradiating the X-ray photosensitive film 11 with X-rays from above the X-ray shielding film 14. The substrate 10 is etched from above the patterned X-ray photosensitive film 11 to form the light reflection preventing concavo-convex structure 3 on the substrate 10 to obtain an antireflection structure. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011099500-A1
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