| abstract |
A resist material that is excellent in resolution and focus margin, has little line width variation and shape deterioration due to PED, and is suitable for fine processing. A photoacid generator for a chemically amplified resist material represented by formula (1). (R is hydrogen, fluorine, chlorine, nitro group, alkyl group or alkoxy group. N is 0 to 1, m is 1 to 2, r is an integer of 0 to 4, and r 'is an integer of 0 to 5.) [Selection figure] None |