http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007324385-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2006-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_867055224ada746eb95f2975f83b6fde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d4799cab242ad724265eab89261740a |
| publicationDate | 2007-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007324385-A |
| titleOfInvention | Resist pattern forming method |
| abstract | There is provided a resist pattern forming method capable of forming a finer resist pattern with high resolution. A resist pattern in which a photoresist film is exposed by irradiating the photoresist film with a liquid (immersion liquid) having a refractive index higher than that of air, thereby exposing the photoresist film to form a resist pattern. A method for forming a resist pattern, comprising a step (d) of peeling the protective film from the surface of the photoresist film using a protective film peeling solution that satisfies the following condition (1). Condition (1): The photoresist film having a thickness of 150 nm is formed on the surface of the substrate, the protective film having a thickness of 90 nm is further formed on the surface of the photoresist film, and the protective film removing liquid is used as the protective film. When the contact is made for 60 seconds, the protective film is peeled off and the photoresist film is dissolved so as to remain in a thickness of 147 nm or more. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053650-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10564546-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170128114-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102309953-B1 |
| priorityDate | 2006-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 395.