http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007293192-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2006-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_796b9a49fe0abe1d93ed2610fedeac3d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9934d76f5c383f53db84f9b59d623b78 |
| publicationDate | 2007-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007293192-A |
| titleOfInvention | Resist composition for immersion exposure and method for forming resist pattern |
| abstract | Provided are a resist composition for immersion exposure and a method for forming a resist pattern, which can suppress substance elution during immersion exposure and have excellent lithography characteristics. A resist composition for immersion exposure comprising a resin component (A) whose alkali solubility is changed by the action of an acid and an acid generator component (B) that generates an acid upon exposure, wherein the resin component ( A) has a resin (A1) having a structural unit (a) derived from tetrafluoroethylene, a structural unit (a ′) derived from acrylic acid, and has the structural unit (a). A resist composition for immersion exposure, which comprises a resin (A2) not contained. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010237627-A |
| priorityDate | 2006-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 245.