http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007287939-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-042 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B55-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2006-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c98a595a992246340131cabd70775d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ac7c5b60600937c0b237be1158e1a82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c2bbdb45d7ef5bb19c0a8ddd96a54e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37d25b2e6e80ba625bdbaf20710a33cb |
| publicationDate | 2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007287939-A |
| titleOfInvention | Polishing method and polishing apparatus |
| abstract | A chemical polishing end point detection technique that can quickly detect the generation of highly toxic gas associated with polishing and implement effective avoidance measures against the danger, and can be applied to an actual polishing process and polishing apparatus. A polishing method and a polishing apparatus for polishing are provided. In a polishing method in which a substrate to be polished W is pressed against a polishing surface 11a of a polishing table 11, and the substrate to be polished W is polished by relative movement of the substrate to be polished W and the polishing surface 11a, polishing of the polishing table 11 is performed. A gas suction pipe 52 for sucking gas is provided immediately above the surface 11a, and the atmospheric gas on the polishing surface 11a is sucked into the gas detector 53 from the gas suction port 52a of the gas suction pipe 52, and a specific component in the atmospheric gas Polish while monitoring the gas. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105643464-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105643464-A |
| priorityDate | 2006-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24345 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524207 |
Total number of triples: 23.