| abstract |
The present invention provides a solvent for cleaning and removal that is particularly excellent for cleaning a pigment-dispersed photosensitive resin composition for forming a color filter or a black matrix pattern. SOLUTION: A propylene glycol monoalkyl ether acetate, a propylene glycol monoalkyl ether, and an aromatic solvent, wherein the aromatic solvent is toluene, xylene, ethylbenzene, and an aromatic solvent having an alkoxy group. A solvent for cleaning and removing a pigment-dispersed photosensitive resin composition, which is at least one selected from the group and has a hydrogen bonding parameter (δ H ) in a Hansen solubility parameter of 5 to 10 . [Selection figure] None |