http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007273843-A

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filingDate 2006-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2df3fde2ccab9d58344680943daf56b9
publicationDate 2007-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007273843-A
titleOfInvention Film formation method, semiconductor layer, and semiconductor element
abstract It is possible to form a film having a uniform and good crystal quality even when a film is formed using a highly active material having a short lifetime and existing in a monoatomic state such as Al or B. To do. One or more kinds of film forming raw materials G are supplied in a vapor phase on a substrate 200, and at least a part of the film forming raw materials G is decomposed, so that constituent elements of the film forming raw materials G are formed on the substrate 200. During vapor phase growth of the film including the film, the substrate 200 is irradiated with the laser light L from at least one direction so that the laser light L passes through the substrate 200 in a direction substantially horizontal to the substrate surface. Supply of the raw material G is implemented. [Selection] Figure 1
priorityDate 2006-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 27.