http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007273641-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80acf29d41c626f58bbf03ec09fe213a |
| publicationDate | 2007-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007273641-A |
| titleOfInvention | Polishing method |
| abstract | A chemical mechanical polishing method in a manufacturing process of a semiconductor device, comprising: an object to be polished having an insulating film having a low relative dielectric constant, a barrier metal layer, and a conductor film; Provided is a polishing method capable of polishing a conductor film, a barrier metal layer, and an insulating film with an appropriate polishing selection ratio while suppressing damage. A chemical mechanical polishing method in a manufacturing process of a semiconductor device, in which an object to be polished is formed by forming a buried wiring through an insulating film having a low relative dielectric constant through a barrier metal layer. Is polished using a polishing liquid containing colloidal silica covered with aluminum atoms. An insulating film having a low dielectric constant is obtained by hydrolyzing (A) a specific silane compound in the presence of (B) a basic compound, (C) water, and (D) a secondary or tertiary alcohol. It is preferably formed using a film-forming composition containing a siloxane resin. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8827771-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009098951-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2324956-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2324956-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5408437-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6301571-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012186198-A |
| priorityDate | 2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 1432.