| abstract |
Provided are a mask blank and a gradation mask having a multilayer film which can be easily etched with little damage to the film when wet etching is performed. SOLUTION: A transparent substrate 11 and a multilayer film 15 (12, 13) formed on the transparent substrate and laminated with at least two layers made of a metal or a metal compound that can be wet-etched are provided. The two layers in contact with each other in the film can be wet-etched using the same etchant. In the two layers in contact, the upper layer is electrochemically lower than the lower layer. A mask blank is provided. [Selection] Figure 2 |