Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_435d9c9b194a593797b0d757710778ec |
publicationDate |
2007-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2007240978-A |
titleOfInvention |
Photosensitive composition, pattern forming method using the composition, and compound used in the composition |
abstract |
[PROBLEMS] To provide a pattern shape and a good pattern collapse used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal and a thermal head, and other photofabrication processes. Use of photosensitive composition having excellent dissolution contrast and immersion exposure suitability, a compound that generates an organic acid having a specific structure upon irradiation with actinic rays or radiation added to the composition, and the photosensitive composition A pattern forming method is provided. A compound that generates an organic acid having a specific structure upon irradiation with actinic rays or radiation, a photosensitive composition containing the compound, and a pattern forming method using the photosensitive composition. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017130629-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017130629-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014149409-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014119698-A1 |
priorityDate |
2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |