http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007240718-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
| filingDate | 2006-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6815af2c2de7d447d16ff5fa12ee41ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0747439fb0500fd6c809d647807b7ebb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e |
| publicationDate | 2007-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007240718-A |
| titleOfInvention | Positive resist composition and resist pattern forming method |
| abstract | A positive resist composition and a resist pattern forming method capable of forming a resist pattern with reduced roughness and excellent shape. A positive resist composition comprising a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) that generates an acid upon exposure, wherein the resin component ( A) is represented by the following general formula (a0) [R is a hydrogen atom, halogen atom, lower alkyl group or halogenated lower alkyl group; Y 1 is an aliphatic cyclic group; Z is an acid dissociable, dissolution inhibiting group; An integer of ˜3, b represents an integer of 0 to 2, and a + b = 1 to 3; c, d and e each independently represents an integer of 0 to 3. And a structural unit (a1) derived from an acrylate ester containing an acetal type acid dissociable, dissolution inhibiting group and not corresponding to the structural unit (a0). A positive resist composition. [Chemical 1] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008039917-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101987880-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101987880-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010145641-A |
| priorityDate | 2006-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 247.