| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 |
| filingDate |
2006-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66847e19f8489e8d6bde6b8413074169
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5251ce2b9b04c24a890936e8ba742a1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2cdfdb7a2bcaed73932a50e34f222e |
| publicationDate |
2007-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007231202-A |
| titleOfInvention |
Copolymer and radiation-sensitive resin composition |
| abstract |
[PROBLEMS] To provide excellent solubility in an alkaline developer and excellent etching resistance. A copolymer containing a repeating unit represented by the formula (1) and a repeating unit having an acid-dissociable group and which is readily soluble in alkali by the action of an acid. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015027992-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012315581-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015024978-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015071744-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009234956-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9513549-B2 |
| priorityDate |
2006-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |