http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007227955-A

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filingDate 2007-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1d89c208fb2fe90cf9e5d70bf49684
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publicationDate 2007-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007227955-A
titleOfInvention Semiconductor device
abstract A technique for effectively suppressing leakage current is provided. A first region having a P-channel TFT on a substrate having an insulating surface, wherein an impurity element imparting P-type is added to a region overlapping with a gate electrode of an active layer of the P-channel TFT. And an active layer of the P-channel TFT has an N-type second region provided so as to surround the first region. In this way, a region having a high barrier in energy can be formed at a place where a current path is likely to occur, thereby preventing leakage current (short channel leakage). [Selection] Figure 12
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