http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007220845-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6f229039f8c1d464840a954959d3b89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54ae7e95ebd7375325aeb869dcb56b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_632ee97b0a3107d5870c18eedcedc8fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c056f15f5e9b4ed8421e7575d6b2fa3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47e8dbdd5470e6c22ab2c24af36cd932 |
| publicationDate | 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007220845-A |
| titleOfInvention | Antireflection film and exposure method |
| abstract | In an immersion lithography technique, there is provided an antireflection film capable of sufficiently reducing the reflectance at the interface between a resist layer and a silicon semiconductor substrate even when the exposure light is incident obliquely. A two-layer antireflection film has a wavelength of 190 to 195 nm and is used when a resist layer is exposed in an exposure system having a numerical aperture of more than 1.0 and not more than 1.1. The complex refractive indexes N 1 and N 2 of the upper layer and the lower layer, which are formed between the layer and the silicon nitride film formed on the surface of the silicon semiconductor substrate and constitute the antireflection film, are expressed as N 1 = n 1 −k 1 i , N 2 = n 2 −k 2 i, the upper and lower layer thicknesses are d 1 and d 2, and the combination of the values of [n 10 , k 10 , d 10 , n 20 , k 20 , d 20 ] When a predetermined combination is selected, n 1 , k 1 , d 1 , n 2 , k 2 , d 2 satisfy the following relational expression. {(n 1 −n 10 ) / (n 1m −n 10 )} 2 + {(k 1 −k 10 ) / (k 1m −k 10 )} 2 + {(d 1 −d 10 ) / (d 1m −d 10 )} 2 + {(n 2 −n 20 ) / (n 2m −n 20 )} 2 + {(k 2 −k 20 ) / (k 2m −k 20 )} 2 + {(d 2 − d 20 ) / (d 2m −d 20 )} 2 ≦ 1 [Selection figure] None |
| priorityDate | 2006-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.