http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007220733-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
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filingDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f78bc8e18a2c435657140bdbc27b375
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29ff8364949f8ce9eb0154f8a2968a27
publicationDate 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007220733-A
titleOfInvention X-ray lithography mask, method for producing the same, method for producing anti-reflection structure using the same, and method for producing a mold, glass molding, or resin molding using the anti-reflection structure
abstract A mask for X-ray lithography that can be manufactured inexpensively and easily is provided. A mask for X-ray lithography 1 is for manufacturing a light reflection preventing structure having a light reflection preventing structure by X-ray lithography. The X-ray lithography mask 1 includes a first substrate 10 that transmits X-rays and an X-ray shielding layer 2. The X-ray shielding layer 2 includes a plurality of X-ray shielding granules 11 that shield X-rays arranged on the first substrate 10 along the plate surface direction. The plurality of X-ray shielding granules 11 are arranged at a pitch equal to or less than the wavelength of light whose reflection is suppressed by the light reflection preventing structure. [Selection] Figure 1
priorityDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 21.