http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007217296-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08
filingDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d07b1cb9736ab4d1c32040bd26b4e3b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1becf2a62465f4acf50e691a5cfcc5
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publicationDate 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007217296-A
titleOfInvention Surface treatment method for internal surface of organosilane production apparatus or storage container
abstract An object of the present invention is to suppress an increase in Cl concentration in organosilane in the production of organosilane which is a semiconductor material gas. Reducing substances such as sodium hypophosphite, sodium sulfite, sodium nitrite, triethylsilane, triisopropylsilane, trimethylsilane, or hydrogen are applied to the inner surface of the iron alloy manufacturing equipment or storage container contaminated with The surface treatment method which makes the surface treatment agent containing contact. [Selection figure] None
priorityDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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