http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007217296-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08 |
filingDate | 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d07b1cb9736ab4d1c32040bd26b4e3b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1becf2a62465f4acf50e691a5cfcc5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f996e12efece5e39f43110fd370c5b64 |
publicationDate | 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2007217296-A |
titleOfInvention | Surface treatment method for internal surface of organosilane production apparatus or storage container |
abstract | An object of the present invention is to suppress an increase in Cl concentration in organosilane in the production of organosilane which is a semiconductor material gas. Reducing substances such as sodium hypophosphite, sodium sulfite, sodium nitrite, triethylsilane, triisopropylsilane, trimethylsilane, or hydrogen are applied to the inner surface of the iron alloy manufacturing equipment or storage container contaminated with The surface treatment method which makes the surface treatment agent containing contact. [Selection figure] None |
priorityDate | 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.