| abstract |
(A) A silicone resin obtained by cohydrolysis / condensation of a hydrolyzable silane monomer mixture containing compounds of formulas (1) to (3), (B) an acid generator, (C) a nitrogen-containing organic compound, (D) A resist composition containing an organic solvent. R 3 R 4 q SiX 3-q (2) R 5 R 6 r SiX 3-r (3) (R 1 is a fluorine atom, an alkyl group or a fluorinated alkyl group. R 2 is a hydrocarbon group, R 3 is an organic group having a carboxyl group protected with an acid-decomposable protecting group as a functional group, R 4 is R Same definition as 2 , R 5 is an organic group having a lactone ring as a functional group, R 6 is the same definition as R 2. X is a hydrogen atom, chlorine atom, bromine atom or alkoxy group, p is 0 or 1, q is 0 Or 1, r is 0 or 1.) [Effects] The resist composition of the present invention exhibits a resolution equal to or higher than that of a conventional resist composition using a fluorinated alcohol with a close proximity carbon as a polar group, and is an organic material in oxygen reactive etching. The problem that the etching selectivity cannot be obtained with a certain lower layer film can be solved, and it is suitable for the two-layer resist method in ArF exposure. [Selection figure] None |