| abstract |
The present invention provides a radiation-sensitive resin composition capable of improving pattern shape as well as improving resolution performance, sensitivity, and depth of focus as a chemically amplified resist sensitive to far ultraviolet rays. SOLUTION: (1) a repeating unit comprising a hydroxystyrene monomer, (2) a repeating unit comprising an alkyloxyalkyloxystyrene monomer, and (3) an alkyloxyalkyloxy different from the above (2). A repeating unit comprising a styrene monomer unit, (4) a repeating unit comprising an butoxycarbonyloxystyrene monomer unit, and (5) a repeating unit comprising a (meth) acrylate monomer unit having a cyclopentyl substituent. The radiation sensitive resin composition containing the polymer containing a unit and a radiation sensitive acid generator. [Selection figure] None |