http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007183556-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1df0c0c4dd30b91733f9c5cd95d28996
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133553
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133555
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343
filingDate 2006-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88473380070c666f54d6e258e49c970b
publicationDate 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007183556-A
titleOfInvention Method for manufacturing pixel structure
abstract A method for manufacturing a pixel structure is provided. A scanning line, a data line, and an active element electrically connected to the scanning line and the data line are formed on a substrate. A dielectric layer is formed on the substrate, and then a patterned photoresist layer is formed thereon. The patterned photoresist layer includes a first recess and a first through hole, and the first through hole exposes a part of the dielectric layer. Using the patterned photoresist layer as an etching mask, a portion of the dielectric layer is removed to form a patterned dielectric layer. The patterned dielectric layer includes a second recess and a second through hole, and the second through hole exposes a part of the active element. The patterned photoresist layer is removed and a reflective layer is formed on the patterned dielectric layer. The reflective layer covers the second recess and is electrically connected to the active element. [Selection] Figure 2F
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010145927-A
priorityDate 2006-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005196172-A
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isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID166598
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449871035

Total number of triples: 20.