| abstract |
In a resist composition dissolved in an organic solvent containing ethyl lactate, a resist composition in which dimensional variation of the resist pattern over time of the resist composition is suppressed, and a method for producing the resist composition are provided. In a resist composition obtained by dissolving a substrate component in an organic solvent (S), the organic solvent (S) contains ethyl lactate and an antioxidant, and the concentration of the antioxidant is organic. It is a resist composition characterized by being 10 ppm or more in the solvent (S). [Selection figure] None |