Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed0897e087fa147bc2eb075dbc8b9c1 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-21 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F230-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_332a3b043f31c65fa5cb081d4c0d341f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89a389c3c5fc840a12b99cab77da369c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d46a8cce846dfdc3cbb1750e05491920 |
publicationDate |
2007-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2007164045-A |
titleOfInvention |
Photosensitive relief pattern forming material |
abstract |
As a surface protection film or interlayer insulating film material for a semiconductor device, a positive type that can use an alkaline developer in a development process, has a low residual temperature, exhibits excellent heat resistance, mechanical properties, etc. due to a low curing temperature. A photosensitive relief pattern forming material is provided. An alkali-soluble substance (A) containing both a cage silsesquioxane structure-containing group and a phenolic hydroxyl group and a dissolution inhibitor (B) are contained in the same molecule. Alkali developable positive photosensitive relief pattern forming material. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8013077-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010107693-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015007674-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011082510-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9235124-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011150276-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008218631-A |
priorityDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |