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filingDate 2006-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fbb97bdfafde6e0d83e020293e29768
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publicationDate 2007-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007156397-A
titleOfInvention Pellicle with less contamination and method for producing the same
abstract Provided is a pellicle in which when a pellicle is peeled off from a photomask, a part of the mask adhesive of the pellicle is peeled off and transferred to the surface of the photomask to leave less adhesive residue. A polyethylene terephthalate film having a thickness of 125 μm that has not been surface-treated is adhered to a mask adhesive layer 9 of a pellicle, and then the polyethylene terephthalate film is peeled in a 180 ° direction with respect to the adhesive surface at a temperature of 23 ° C. A pellicle 1 having a peeling strength of 0.004 N / mm to 0.10 N / mm. Preferably, an acrylic emulsion adhesive is used as the mask adhesive 7 that adheres to the photomask. [Selection] Figure 1
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