http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007155927-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 |
| filingDate | 2005-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17fa68d9b679a3e60b32a661df077b9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36ada78c4fa19ad10875a3094dda4e50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0843bfcba51b8e80c60dbebee3f58a84 |
| publicationDate | 2007-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007155927-A |
| titleOfInvention | Diffractive optical element manufacturing method, diffractive optical element, and reticle mask used in the manufacturing method |
| abstract | A stepwise diffractive optical element manufacturing method in which a series of processing processes including a drawing exposure process that selectively performs pattern exposure and patterning using a drawing exposure apparatus, a development process, an etching process, and the like is repeated. Provided are a diffractive optical element and a method for manufacturing the same, which eliminates the deterioration of the characteristics of the optical element due to errors and further dramatically improves mass productivity. Projection exposure is performed by using a reticle mask that arranges a photosensitive material layer on one surface of a processing substrate and controls the distribution of transmitted light amount (exposure amount) during exposure according to the distribution state of fine dot patterns. In the method, the photosensitive material layer is exposed and developed to form a first concavo-convex pattern using the photosensitive material layer as a material, and etching is performed from the first concavo-convex pattern forming side, The step of forming the second concavo-convex pattern corresponding to the concavo-convex shape of the first concavo-convex pattern on one surface of the processing substrate as the concavo-convex pattern of the diffractive optical element without the first concavo-convex pattern. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012157697-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016085325-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016085324-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106842606-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022020733-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8587767-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018184375-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106842606-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011519172-A |
| priorityDate | 2005-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID180504 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453983605 |
Total number of triples: 26.