http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007144536-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate | 2005-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e53bcaa7385229be594850214e6f063 |
| publicationDate | 2007-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007144536-A |
| titleOfInvention | Substrate manufacturing method |
| abstract | A method for manufacturing a substrate and a method for reducing nanoscratches that can significantly reduce nanoscratches of a substrate after polishing. A substrate manufacturing method comprising a step of supplying a polishing composition containing colloidal silica and an acid or a salt thereof to a substrate or a polishing pad and polishing the substrate. A method for producing a substrate in which the aluminum concentration in the polishing liquid composition when supplied is 50 ppm or less, and a polishing liquid composition containing colloidal silica and an acid or a salt thereof are supplied to the substrate or polishing pad. A method for reducing nanoscratches comprising a step of polishing the substrate, wherein the aluminum concentration in the polishing composition when supplied to the substrate or polishing pad is 50 ppm or less. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014079820-A |
| priorityDate | 2005-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.