http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007133333-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_968a9fb00a21712fff7f224cafa32388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0be7e5e7d2ae4ca2faf64e7c640a81a |
| publicationDate | 2007-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007133333-A |
| titleOfInvention | Photosensitive composition and photosensitive film, and permanent pattern and method for forming the same |
| abstract | An image can be formed by UV exposure, the tackiness of the surface is small, the laminating and handling properties, storage stability, high sensitivity and excellent developability, chemical resistance, surface hardness, heat resistance, dielectric properties, etc. And a photosensitive film using the same. (A) A polymer having one or more carboxyl groups and ester groups in one molecule, (B) a polymerizable compound, (C) a photopolymerization initiator, (D) The photosensitive resin composition and photosensitive film containing 1 type of compounds selected from the compound represented by General formula (1)-(3), a permanent pattern, and its formation method. [Selection figure] None |
| priorityDate | 2005-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 894.