| abstract |
Disclosed is a coating material comprising a low-molecular or medium-molecular cyclic compound based on a novel concept that has high etching resistance, high solvent solubility, and high adhesion to a substrate, a resist material using the same, and a pattern formation method To do. A coating material, a resist material, and a novel low or medium molecular organic compound derived from a diol compound and a bicyclo [2.2.2] octane-2,3: 5,6-tetracarboxylic acid compound A fine pattern forming method using the same. [Selection figure] None |