http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007114719-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2006-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 |
| publicationDate | 2007-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007114719-A |
| titleOfInvention | Positive resist composition and pattern forming method using the same |
| abstract | A positive resist composition having good sensitivity, resolving power, pattern shape, small line edge roughness, and good surface roughness, and pattern formation using the same, for pattern formation by actinic rays or radiation Provide a method. SOLUTION: (A) A compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a resin having a specific repeating unit, whose solubility in an alkali developer is increased by the action of an acid (C) A positive resist composition containing a low molecular weight lactone compound represented by the general formula and a pattern forming method using the same. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011093868-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015129355-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009300749-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008007578-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015161823-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010160283-A |
| priorityDate | 2005-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 266.