http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007108613-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate | 2005-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f937b7e6e263345d1252828bd3705e17 |
publicationDate | 2007-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2007108613-A |
titleOfInvention | Method for producing photosensitive material |
abstract | A method for producing a photosensitive material having good temporal stability is provided. SOLUTION: Polymer having phenyl group substituted with vinyl group in side chain, photo radical generator, sensitizer having absorption in wavelength range of visible light to infrared light and sensitizing photo radical generator. In applying a photosensitive composition containing at least 2 to a support, the solvent of the photosensitive composition contains at least two kinds of solvents, and the difference in water / octanol partition coefficient (LogP) of the solvent is 1 or less. A method for producing a photosensitive material. [Selection figure] None. |
priorityDate | 2005-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 214.