| abstract |
In the formation of an upper antireflection film that is safe without adverse effects on the human body and excellent in low refractive index, transparency, coating uniformity, etc. without using a fluorinated surfactant such as PFOS, and in an immersion exposure method Photoresist upper layer film formation that is suitably applied to the formation of a protective film that suppresses the influence of immersion exposure liquid on the photoresist film and the influence of the elution components from the photoresist film on the immersion exposure liquid itself Providing materials for use. A photoresist upper layer film-forming material used by being laminated on a photoresist layer on a substrate, comprising a fluorine-containing polymer having a structural unit represented by the following formula (I). [Wherein, Q is a carboxyl group, a hydroxyl group; A is an alkylene group having 1 to 5 carbon atoms, or does not exist; m is a repeating unit; n is an integer of 1 to 5. ] [Selection] Figure 1 |