| abstract |
The present invention provides a composition for forming an antistatic film capable of forming a transparent film or a resin molded product excellent in antistatic performance, haze, transparency, strength, scratch resistance, hardness and the like. An antistatic film-forming composition comprising (i) inorganic oxide fine particles having sulfonic acid groups on the surface and (ii) a matrix-forming component. The matrix-forming component is a hydrolyzate of an organosilicon compound having proton conductivity or a coating resin. In addition, (iii) a proton donor is included. The content of sulfonic acid groups on the surface of the inorganic oxide fine particles is in the range of 15 to 45% by weight in the inorganic oxide fine particles having sulfonic acid groups on the surface. [Selection figure] None |