http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007105836-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2005-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86617ac0bc0c7d86bfc0f0a1ad1e0266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62f9097e111dcb2011e5878774f1e5e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93509743e17fb0a40aa35aa546358d29 |
| publicationDate | 2007-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007105836-A |
| titleOfInvention | Polishing pad and polishing apparatus |
| abstract | In a polishing pad used for forming a flat surface in glass, semiconductor, dielectric / metal composite, integrated circuit, etc., scratches are hardly generated on the substrate surface, and the polishing state is optically good during polishing. Provided are a polishing pad and a polishing apparatus capable of measuring the above. A polishing pad having a polishing layer 1 and having a through-hole 14 communicating with the polishing surface and the back surface, and having a path 15 communicating with the through-hole and the side surface of the polishing pad. The polishing apparatus is equipped with such a polishing pad. [Selection] Figure 3 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010023134-A |
| priorityDate | 2005-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 62.